• HCELL selection for LVS

    HCELL selection can be a controversial topic. I would like to describe a few different techniques, the rationale behind those techniques, and hopefully generate some discussion based on your experiences.   One t...
    chris_balcom
    last modified by chris_balcom
  • Mentor bolsters Calibre DFM toolset with Ponte acquisition

    In order to help reduce the impact of process variability during semiconductor design and manufacturing, Mentor  has acquired the assets of Mountain View, Calif.-based Ponte Solutions Inc, a developer of model-ba...
    smitha_teegala
    last modified by smitha_teegala
  • Calibre LFD for controlling manufacturing variability at 65 nanometer

      STMicroelectronics has selected the Mentor Graphics Calibre® DFM (design for manufacturing) platform with the Calibre LFDTM (Litho-Friendly-Design) system for its Litho Variability Analysis solution aimed...
    karen_chow
    last modified by karen_chow
  • Calibre Model-based Planarity Flow for TSMC’s 65 and 40 nanometer IC Manufacturing Processes

    Mentor Graphics Corporation (Nasdaq: MENT) today announced that its SmartFill model-based planarity flow has been qualified for TSMC's 65 and 40 nanometer (nm) processes. By reducing metal thickness variability, model...
    karen_chow
    created by karen_chow
  • DFM SPEC FILL

    How sub command FILLMIN and FILLMAX work with FILLSHAPE  [DFM SPEC FILL].. Is it use for 3D ? will it recognize via or its simple layer .   Ashish
    arajput
    last modified by arajput
  • Tips & Tricks

    Have you ever had a huge GDS file from which you just wanted to know what the TOP cellname was, what layers were in it, or what cells? Recently, I came across a newer DESIGNrev API command that called "layout peek" th...
    James
    last modified by James
  • New reduction technique in Calibre xRC 2008.2

    There's a new reduction switch in Calibre xRC 2008.2 which makes it easier to do reduction. The new switch is called PEX REDUCE DIGITAL, and it's a combination of our TICER reduction, as well as our PEX REDUCE CC. It ...
    karen_chow
    last modified by karen_chow
  • Update #2: Calibre 2008.2_33

      Hi everyone. I just wanted to let you know that we have just released the Update #2 for Calibre 2008.2. If you need to download this update release, you can download it from supportnet at:     Suppo...
    karen_chow
    created by karen_chow
  • Script to sort DRC run times

    Dear all, I am RaviShankar, from NXP. I work for the 'flow development' group. This is my first post. Before I begin, many thanks for putting these forums in place. I am sure these forums are going to be of great help...
    tsravi.shankar
    last modified by tsravi.shankar
  • install calibre v2006

    hi everybody! I'm a new user about calibrev2006 for linux. Can you help me to install calibre V2006 because it doesn't have any direction as another software for linux Detailed installation is better. thanks!
    thanhchi_151
    last modified by thanhchi_151
  • How to get the pin order wanted in my extraction netlist from Calibre xRC?

      How to get the pin order wanted in my extraction netlist from Calibre xRC?    
    karen_chow
    last modified by karen_chow
  • new command  clarification

      My deck has following command DFM COPY , Its  giving error 2008.1_13.11.i686 .  Its new command with latest calibre version ? , Please clarify which version of calibre support this command .   ...
    arajput
    last modified by arajput
  • Mentor Consulting Slashes Time-to-Mask at Dongbu HiTek with Optimized Calibre Flow

      WILSONVILLE, Ore., July 22, 2008 - Mentor Graphics Corporation (Nasdaq: MENT) today announced that its consulting division has successfully completed an engagement at Dongbu HiTek, resulting in a 50 percent re...
    karen_chow
    last modified by karen_chow
  • LVS falure for block in toplevel

    Hi, I have a analog block which comes clean during stand alone lvs but fails when hooked up at the top level. Interfaces have clean connections.  If this block is black boxed during lvs (LVS BOX command) top leve...
    nagaraj.kumbar
    last modified by nagaraj.kumbar
  • U2U 2008 Registration is Open!

    See you at User 2 User! Learn, Share and Network with hundreds of your peers at User2User 2008, the Mentor Graphics International User Conference held at the Santa Clara Marriott on November 4-6, 2008.   ST...
    James
    last modified by James
  • Super-Simple TVF example

    For those who may be new to TVF, here is a super-simple example to get you started. This example will write out the data on GDS layer numbers specified in the function call simple_layer below. #! tvf tvf::VERBATIM ...
    James
    last modified by James
  • Run Calibre Interactive in Batch mode

    I've been asked if it is possible to run Calibre Interactive without actually opening the GUI several times. You can by adding the -batch option to the Calibre command line. calibre -gui -drc -runset runset.txt -bat...
    James
    last modified by James
  • Change Calibre View Setup dialog options when running Calibre xRC in the Cadence environment

    Here's a fairly common question on Calibre Integration to the Cadence environment. Calibre xRC's integration to the Cadence tools provides back-annotation of parasitic results for use when simulating with ADE by crea...
    James
    last modified by James
  • Is the manufacturing group being heard?

    With today's PCB designs, understanding the impact of that design on manufacturing is critical to bringing products to market. However, how easy or difficult is it for the process and test engineers at the sharp end o...
    mark_laing
    last modified by mark_laing
  • Simulation!? Who has time for that?

    The schedule is compressed, the project is already late and it hasn't even started, and you've got a million tasks to get done in the next 9 months.  Why would you throw an extra task like signal integrity simula...
    Steve_McKinney
    last modified by Steve_McKinney