Log in to create and rate content, and to follow, bookmark, and share content with other members. If this is your first time posting in the forum, please introduce yourself and say hi to everyone in the community. I'm Karen Chow, and I work at Mentor Graphics as a Technical Marketing Engineer for Calibre x... HCELL selection can be a controversial topic. I would like to describe a few different techniques, the rationale behind those techniques, and hopefully generate some discussion based on your experiences. One t... Which methods are popular and why? This document summarizes inputs from various users and Mentor folks. Initially based on the "HCELL Selection for LVS" discussion thread at HCELL selection for LVS hcell analysis tool... Hi all. There's a new press release that talks about the UMC validation of Calibre nmDRC for 65 nm. http://www.mentor.com/company/news/umcvalidatecalibrenmdrcphysicalverificationumc65nm.cfm ... These scripts are useful if you need to run a large number of gds files through Calibre xRC. For exmaple, I've run 50 different gds files using this method. This tar file contains two tcl scripts: tc.tcl: This takes... The Calibre pull down menu does not show up automatically on the Cadence Schematic Viewer. I need to click on Analog Environment first, for the Calibre menu to show up. I am using 2007.3 version of Calibre and 5.1 v... There's a new paper that came out at SPIE called System to Improve RET-OPC Production by Dynamic Design Coverage Using Sign-off Litho Simulator. It's an article that talks aboiut allowing RET/OPC production sy... There's a new tech note inside the Mentor Graphics SupportNet site that talks about the available support documents for the Calibre xRC calibreview integration into the Cadence Virtuoso environment. The technote ID is... Hi All, Please introduce yourself to the DFM group with your current design focus and your interest areas. My name is Smitha Teegala.I am a Corporate Marketing Engineer at Mentor Graphics and have join... Mentor Graphics Corporation (NASDAQ: MENT) today announced it has aligned its integrated circuit (IC) implementation product lines under the Design-to-Silicon division to better address the design and manufact... Here's some information from a tech note in Supportnet that was recently published: MG242346 Symptom: When performing an inductance extraction if you encounter these errors below:... In order to help reduce the impact of process variability during semiconductor design and manufacturing, Mentor has acquired the assets of Mountain View, Calif.-based Ponte Solutions Inc, a developer of model-ba... When designing in P&R environments, standard cells and IP blocks are represented as LEF cells with abstract data in them. To run Calibre DRC or LVS on a GDS file, the DEF design must be translated to GDS a... STMicroelectronics has selected the Mentor Graphics Calibre® DFM (design for manufacturing) platform with the Calibre LFDTM (Litho-Friendly-Design) system for its Litho Variability Analysis solution aimed... Mentor Graphics Corporation (Nasdaq: MENT) today announced that its SmartFill model-based planarity flow has been qualified for TSMC's 65 and 40 nanometer (nm) processes. By reducing metal thickness variability, model... Most of the foundary provide DFM deck and all user use it blindly . Most of the time its increase are and decrease random yield TVF calibre deck line number is diffrent from reported by calibre if any bug in that line . How trace it with calibre deck Hi, Specifically, my comments will be focused on using the Calibre Interactive (GUI) for xRC but it could apply to the other flows as well. We have many users of the GUI at my company including ... Link to vim script for Calibre: http://www.vim.org/scripts/script.php?script_id=688 (The link on vim.org points back here!) created by Alvin Santos\ script type syntax description ... How sub command FILLMIN and FILLMAX work with FILLSHAPE
[DFM SPEC FILL]..
Is it use for 3D ? will it recognize via or its simple layer . Ashish