• Introduce yourself

    If this is your first time posting in the forum, please introduce yourself and say hi to everyone in the community.   I'm Karen Chow, and I work at Mentor Graphics as a Technical Marketing Engineer for Calibre x...
    karen_chow
    last modified by karen_chow
  • HCELL selection for LVS

    HCELL selection can be a controversial topic. I would like to describe a few different techniques, the rationale behind those techniques, and hopefully generate some discussion based on your experiences.   One t...
    chris_balcom
    last modified by chris_balcom
  • HCELL selection methods

    Which methods are popular and why? This document summarizes inputs from various users and Mentor folks. Initially based on the "HCELL Selection for LVS" discussion thread at HCELL selection for LVS hcell analysis tool...
    chris_balcom
    last modified by chris_balcom
  • UMC validation of nmDRC for 65 nm

      Hi all. There's a new press release that talks about the UMC validation of Calibre nmDRC for 65 nm.     http://www.mentor.com/company/news/umcvalidatecalibrenmdrcphysicalverificationumc65nm.cfm ...
    karen_chow
    created by karen_chow
  • Scripts for running batch jobs of Calibre xRC with multiple

    These scripts are useful if you need to run a large number of gds files through Calibre xRC. For exmaple, I've run 50 different gds files using this method. This tar file contains two tcl scripts: tc.tcl: This takes...
    karen_chow
    last modified by karen_chow
  • Automatically Displaying Calibre pull down menu on Cadence Schematic viewer

    The Calibre pull down menu does not show up automatically on the Cadence Schematic Viewer. I need to click on Analog Environment first, for the Calibre menu to show up. I am using 2007.3 version of Calibre and 5.1 v...
    architha_nath
    last modified by architha_nath
  • System to Improve RET-OPC Production by Dynamic Design Coverage Using Sign-off Litho Simulator

      There's a new paper that came out at SPIE called System to Improve RET-OPC Production by Dynamic Design Coverage Using Sign-off Litho Simulator. It's an article that talks aboiut allowing RET/OPC production sy...
    karen_chow
    created by karen_chow
  • Support documents for the Calibre xRC CalibreView Integration into the Cadence Virtuoso Design Environment

    There's a new tech note inside the Mentor Graphics SupportNet site that talks about the available support documents for the Calibre xRC calibreview integration into the Cadence Virtuoso environment. The technote ID is...
    karen_chow
    last modified by karen_chow
  • Introduce yourself to the Electrifing DFM Discussion group

    Hi All,   Please introduce yourself to the DFM group with your current design focus and your interest areas.   My name is Smitha Teegala.I am a Corporate Marketing Engineer at Mentor Graphics and have join...
    smitha_teegala
    last modified by smitha_teegala
  • Mentor Graphics Aligns Product Groups to Address IC Implementation Challenges at 45nm and Beyond

      Mentor Graphics Corporation (NASDAQ: MENT) today announced it has aligned its integrated circuit (IC) implementation product lines under the Design-to-Silicon division to better address the design and manufact...
    karen_chow
    created by karen_chow
  • Calibre xRC/xL Error: Net Information could not be built. Error: The inputs for the inductance engine could not be properly built

      Here's some information from a tech note in Supportnet that was recently published: MG242346     Symptom:     When performing an inductance extraction if you encounter these errors below:...
    karen_chow
    created by karen_chow
  • Mentor bolsters Calibre DFM toolset with Ponte acquisition

    In order to help reduce the impact of process variability during semiconductor design and manufacturing, Mentor  has acquired the assets of Mountain View, Calif.-based Ponte Solutions Inc, a developer of model-ba...
    smitha_teegala
    last modified by smitha_teegala
  • How do you merge your P&R design and GDS IP cells together

      When designing in P&R environments, standard cells and IP blocks are represented as LEF cells with abstract data in them. To run Calibre DRC or LVS on a GDS file, the DEF design must be translated to GDS a...
    James
    last modified by James
  • Calibre LFD for controlling manufacturing variability at 65 nanometer

      STMicroelectronics has selected the Mentor Graphics Calibre® DFM (design for manufacturing) platform with the Calibre LFDTM (Litho-Friendly-Design) system for its Litho Variability Analysis solution aimed...
    karen_chow
    last modified by karen_chow
  • Calibre Model-based Planarity Flow for TSMC’s 65 and 40 nanometer IC Manufacturing Processes

    Mentor Graphics Corporation (Nasdaq: MENT) today announced that its SmartFill model-based planarity flow has been qualified for TSMC's 65 and 40 nanometer (nm) processes. By reducing metal thickness variability, model...
    karen_chow
    created by karen_chow
  • What extra require after DFM deck

    Most of the foundary provide DFM deck and all user use it blindly . Most of the time its increase are and decrease random yield
    arajput
    last modified by arajput
  • How to debug TVF calibre deck

    TVF calibre deck line number is diffrent from reported by calibre if any bug in that line . How trace it with calibre deck
    arajput
    last modified by arajput
  • Should Calibre Interactive be improved?

      Hi,     Specifically, my comments will be focused on using the Calibre Interactive (GUI) for xRC but it could apply to the other flows as well. We have many users of the GUI at my company including ...
    Daran
    last modified by Daran
  • calibre.vim : Syntax Highlight for MGC SVRF (Calibre) Standard Verification Rules Format

    Link to vim script for Calibre:   http://www.vim.org/scripts/script.php?script_id=688 (The link on vim.org points back here!)   created by Alvin Santos\ script type syntax description ...
    karen_chow
    last modified by obsidian
  • DFM SPEC FILL

    How sub command FILLMIN and FILLMAX work with FILLSHAPE  [DFM SPEC FILL].. Is it use for 3D ? will it recognize via or its simple layer .   Ashish
    arajput
    last modified by arajput