Calibre LFD for controlling manufacturing variability at 65 nanometer

Discussion created by karen_chow on May 23, 2008
Latest reply on Jan 6, 2009 by Fabrice.BERNARD-GRANGER


STMicroelectronics has selected the Mentor Graphics Calibre® DFM (design for manufacturing) platform with the Calibre LFDTM (Litho-Friendly-Design) system for its Litho Variability Analysis solution aimed at controlling manufacturing variability at 65 nanometer (nm) and beyond. The announcement follows an extensive evaluation of commercially available solutions by STMicroelectronics based on accuracy, speed and ability to integrate with existing design flows. This decision builds on the existing relationship between STMicroelectronics and Mentor, which started with the use of Calibre OPC tools at 130nm, and has continued for all following nodes, including 45nm.



To see this press release, please go to: